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Breaking News: MIIT Promotes Domestic DUV Lithography Machines with ≤8nm Overlay Accuracy

The MIIT's 2024 guidelines promote full-process localization for 28nm+ chip manufacturing, a crucial tech milestone. Key advancements include KrF and ArF lithography machines, enabling high-precision circuits and boosting industry self-reliance. Precise temperature control is vital for these processes, with TEYU CWUP water chillers ensuring stable performance in semiconductor manufacturing.

December 06, 2024

In recent months, the Ministry of Industry and Information Technology (MIIT) issued the "Guidelines for the Promotion and Application of First (Set) Major Technical Equipment (2024 Edition)". This paves the way for full-process localization of mature chip manufacturing for nodes above 28nm!


Although 28nm technology isn’t cutting-edge, it holds significant importance as the dividing line between low-to-mid-end and mid-to-high-end chips. Aside from advanced CPUs, GPUs, and AI chips, most industrial-grade chips rely on 28nm or higher technologies.


MIIT Promotes Domestic DUV Lithography Machines with ≤8nm Overlay Accuracy


Working Principle: Advancements in Deep Ultraviolet Lithography

KrF (Krypton Fluoride) and ArF (Argon Fluoride) lithography machines fall under the category of Deep Ultraviolet (DUV) lithography. Both utilize specific light wavelengths projected through optical systems onto the photoresist layer of a silicon wafer, transferring intricate circuit patterns.

KrF Lithography Machines: Use a 248nm wavelength light source, achieving resolutions below 110nm, suitable for various integrated circuit manufacturing processes.

ArF Lithography Machines: Use a 193nm wavelength light source, offering higher resolution for sub-65nm process technologies, enabling the fabrication of finer circuits.


Technological Significance: Industry Upgrade and Self-Reliance

The development of these lithography machines marks a major milestone in advancing semiconductor manufacturing and achieving industrial autonomy:

Technical Breakthroughs: The successful creation of KrF and ArF lithography machines highlights significant progress in high-end lithography technology, providing robust technical support for semiconductor manufacturing.

Industry Upgrade: High-precision lithography machines enable the production of more complex and high-performance integrated circuits, driving innovation across the entire semiconductor value chain.

Economic and National Security: By reducing dependence on foreign technology, these machines strengthen the domestic semiconductor industry's self-sufficiency, bolstering economic and industrial security.


Water Chiller: The Key to Stable Lithography Machine Performance

Precise temperature control is essential for ensuring the quality and yield of the lithography process. Water chillers, as core components of cooling systems, play a vital role:

Cooling Requirements: Lithography machines are extremely sensitive to temperature fluctuations during exposure, necessitating water chillers that provide highly accurate and stable temperature control.

Functions of Chillers: By circulating cooling water, chillers effectively dissipate heat generated during operation, maintaining laser equipment within an optimal temperature range and ensuring accuracy and reliability in the lithography process.


Ultrafast laser chiller CWUP-20ANP with 0.08℃ stability


TEYU Chiller Offer Professional Cooling Solutions for Lithography Machines

TEYU CWUP series ultrafast laser chillers can provide precise and stable temperature control for lithography machines. The chiller model CWUP-20ANP achieves temperature stability of ±0.08°C, delivering highly efficient cooling for precision manufacturing.


In the precise world of semiconductor manufacturing, lithography machines are the core devices for the transfer of microcircuit patterns. With the advancement of technology, krypton fluoride lithography machine and argon fluoride lithography machine have become an important force to promote the development of the industry with their excellent performance.

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